W. Zhu et al. tau fabricated ultrafine siab purity hmoov ntawm 1200 ~ 1400 degree los ntawm cov tshuaj vapor deposition siv silane thiab acetylene raws li cov tshuaj tiv thaiv gases thiab hydrogen raws li cov cab kuj roj. Siv hexamethylsilane ua cov tshuaj tiv thaiv thiab hydrogen thiab argon ua cov pa roj carbon monoxide, Anaguta li al. kuj fabricated ultrafine siab purity siab purity silicon hmoov los ntawm tshuaj vapor deposition ntawm 1050 ~ 1250 degree.
Cov tswv cuab ntawm ob pawg tshawb fawb no tau siv tshuaj vapor deposition los tsim cov purity silicon hmoov siv cov khoom siv roj. Txawm li cas los xij, fabricated ultrafine hmoov yog nanoscale. Txawm hais tias qhov purity siab, nws tsis yooj yim rau kev sau thiab tsis haum rau kev tsim cov khoom siv high-purity high-purity silicon hmoov nyob rau hauv ntau qhov ntau, uas tsis haum rau kev tsim kho ntawm industrialization tom qab theem.
Txoj kev tsim khoom nrog kev thauj mus los tsis siv neeg
Txoj kev no siv cov hmoov silicon thiab carbon dub ua cov khoom siv raw, ntxiv lwm cov activators, thiab ncaj qha reacts ntawm 1000 ~ 1150 degree los tsim cov hmoov. Cov kev taw qhia ntawm catalyst yuav inevitably cuam tshuam rau purity thiab zoo ntawm lub manufactured high-purity silicon hmoov.
Yog li ntawd, ntau tus kws tshawb fawb tau tawm tswv yim txhim kho tus kheej-propagating synthesis txoj hauv kev no. Qhov kev txhim kho tseem ceeb yog kom tsis txhob muaj kev taw qhia ntawm tus activator thiab kom ntseeg tau tias muaj cov tshuaj tiv thaiv kev ua haujlwm tas mus li thiab muaj txiaj ntsig zoo los ntawm kev ua kom cov khoom kub thiab txias tas mus li. Raws li thaum ntxov li 1999, nyob rau hauv Nyiv, hmoov nrog particle qhov ntau thiab tsawg ntawm 10 ~ 500 μm tau tsim los ntawm combustion txoj kev nyob rau hauv thaj tsam ntawm 1700 ~ 2000 degree siv ethyl orthosilicate raws li silicon qhov chaw thiab phenolic resin raws li cov pa roj carbon, thiab qhov loj feem ntawm cov ntsiab lus impurity tsawg dua 0.5 × 10-6.
Txawm li cas los xij, cov reactants ntawm txoj kev no siv cov khoom siv organic, yog li tus nqi ntawm cov khoom siv raw yog siab, uas tsis yog qhov tsim nyog rau cov khoom loj ntawm high-purity silicon hmoov. Cov kws tshawb fawb ntawm Shanghai lub koom haum ntawm Silicon Research ntawm Suav Academy ntawm Sciences tsim nyob rau hauv high kub nyob rau hauv ib tug argon cua nrog loj feem ntawm 99.9% thiab 99.999%, feem.
Cov kws tshawb fawb tau siv cov pa roj carbon activated (particle loj 20 ~ 100 μm) thiab flake graphite (particle loj 5 ~ 25 μm) raws li cov pa roj carbon monoxide (mass feem 99.9%) thiab high-purity silicon raws li cov khoom siv silicon (particle loj 10 ~ 270 μm). , pawg pawg 99.999%), feem.
High-purity silicon hmoov tau npaj nyob rau hauv lub tshuab nqus tsev kub sintering rauv ntawm 1900 degree nyob rau hauv argon cua. Cov kev sim tau pom tias qhov purity ntawm high-nqus fabricated yog superior rau cov high-purity silicon hmoov fabricated nyob rau hauv cov cab kuj roj. Tsis tas li ntawd, monocrystals tau loj hlob siv high-purity silicon hmoov tsim nyob rau hauv lub tshuab nqus tsev siab. Cov txiaj ntsig tau pom tias cov monocrystals loj hlob yog cov purity siab thiab muaj cov khoom zoo heev semi-insulating, uas ua tau raws li qhov yuav tsum tau muaj ntawm cov khoom siv rau cov khoom siv hluav taws xob ntawm semi-insulating substrates. Outlook rau High-Purity Powder Manufacturing Technology
Kev txhim kho tus kheej-propagating fabrication yog ib txoj hauv kev loj hlob ib leeg muaju hauv chav kuaj vim nws cov khoom siv qis thiab yooj yim. Cov txheej txheem kev tsim khoom sib txawv tau pom tias muaj kev cuam tshuam rau cov khoom tsim khoom.
